年度	2011
全部作者	李义明
论文名称	Yiming Li, Chih-Hong Hwang, Shao-Ming Yu, Hui-Wen Cheng, Hsuan-Ming Huang, and Ta-ChingYeh, “Process-Variation- and Random-Dopant-Induced Threshold Voltage Fluctuations in Nanometer Scale Planar MOSFET and Bulk FinFET Devices,” Accepted by The 4th International Symposium on Advanced Gate Stack Technology (IEEE ISAGST 2007), Westin City Center Hotel, Dallas, Texas, September 26-28, 2007.
发表日期	2011-08-01