Year | 2011 |
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Authors | Li, Yiming |
Paper Title | Chih-Hong Hwang, Tien-Yeh Li, Ming-Hung Han, Kuo-Fu Lee, Hui-Wen Cheng, and Yiming Li, “Statistical Analysis of Metal Gate Workfunction Variability, Process Variation, and Random Dopant Fluctuation in Nano-CMOS Circuits,” Proceedings of The 2009 IEEE International Conference on Simulation of Semiconductor Processes and Devices (IEEE SISPAD 2009), Hotel Del Coronado, San Diego, California,USA, Sept. 9-11, 2009, 4pp. |
Date of Publication | 2011-08-01 |