Year	2011
Authors	Li, Yiming
Paper Title	Chun-Yen Yiu, Yen-Hui Lee, Thet-Thet Khaing, Kuo-Fu Lee, Yiming Li, “Dual Material Gate Approach to Suppression of Random-Dopant-Induced Characteristic Fluctuation in 16 nm MOSFET Devices,”Proceedings of 2010 International Electron Devices and Materials Symposium (IEDMS 2010), Chungli,Taiwan, Nov. 18-19. 2010, p. D4-3.
Date of Publication	2011-08-01