Year	2011
Authors	Li, Yiming
Paper Title	Chun-Yen Yiu, Yung-Yueh Chiu, Thet-Thet Khaing, Kuo-Fu Lee, Yiming Li, “Suppression of Random-Dopant-Induced Characteristic Fluctuation in 16 nm MOSFET Devices Using Dual-Material Gate,”Proceedings of IEEE International Symposium on Next-Generation Electronics (IEEE ISNE 2010),Kaohsiung, Taiwan, Nov. 4-5, 2010, pp. 28-31.
Date of Publication	2011-08-01