Year | 2011 |
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Authors | Li, Yiming |
Paper Title | Hui-Wen Cheng, Chih-Hong Hwang, Chung-Jung Hsieh, and Yiming Li, “Electrical Characteristics Dependence on the Channel Fin Aspect Ratio of Multi-Fin Field Effect Transistors,” Presented in The 2008 International Electron Devices and Materials Symposia (IEDMS), National Chung Hsing University, Taichung, Taiwan, Nov. 28-29, 2008. |
Date of Publication | 2011-08-01 |