Year | 2011 |
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Authors | Li, Yiming |
Paper Title | Hui-Wen Cheng, Chih-Hong Hwang and Yiming Li, “Characteristics Dependence on the Vertical Channel Aspect Ratio of Multi-Fin Field Effect Transistors Including Dopant Fluctuation,” Workshop Abstracts of The 2009 IEEE Silicon Nanoelectronics Workshop (IEEE SNW 2009) Kyoto, Japan, June 13-14, 2009, pp.55-56. |
Date of Publication | 2011-08-01 |