Year | 2011 |
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Authors | Li, Yiming |
Paper Title | Hui-Wen Cheng and Yiming Li, “Random Work Function Variation Induced Threshold Voltage Fluctuation in 16-nm Bulk FinFET Devices with High-k-Metal-Gate Material,” Proceedings of The 14th IEEE International Workshop on Computational Electronics (IEEE IWCE 2010), Pisa, Italy, Oct. 27-29, 2010, pp.331-334. |
Date of Publication | 2011-08-01 |