Year | 2011 |
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Authors | Li, Yiming |
Paper Title | Hui-Wen Cheng and Yiming Li, “Three-Dimensional Device Simulation of Random Work Function Effect on 16-nm CMOS Devices Induced by Nanosized Grains of Metal Gate,” Proceedings of The 8th International Conference of Computational Methods in Sciences and Engineering (ICCMSE 2010), Kos, Greece, Oct. 3-8,2010, p. 16-1. |
Date of Publication | 2011-08-01 |