Year 2011
Authors Li, Yiming
Paper Title Kuo-Fu Lee, Yiming Li, Chun-Yen Yiu, and Thet-Thet Khaing, “Effective Suppression of Random-Dopant-Induced Characteristic Fluctuation Using Dual Material Gate Technique for 16 nm MOSFET Devices,” Proceedings of 2010 International Conference on Solid State Devices and Materials (SSDM 2010), Tokyo, Japan, Sep. 22-24, 2010, pp. 697-698.
Date of Publication 2011-08-01