Year	2011
Authors	Li, Yiming
Paper Title	Ming-Hung Han, Chih-Hong Hwang, and Yiming Li, “Metal-Gate Workfunction Fluctuation (WKF), Process Variation Effect (PVE) and Random Dopant Fluctuation (RDF) in 16 nm CMOS Device and Analog Circuit,” Proceedings of The 2009 International Electron Devices and Materials Symposia (IEDMS 2009),Chang Gung University, Kweishan, Taiwan, Nov. 19-20, 2009, pp. 733-734.
Date of Publication	2011-08-01