Year 2011
Authors Li, Yiming
Paper Title

Yiming Li, Chih-Hong Hwang, Tien-Yeh Li, and Ming-Hung Han, "Process Variation Effect, Metal-Gate Workfunction and Random Dopant Fluctuations in Emerging CMOS Technologies" , IEEE Transactions on Electron Devices, Vol. 57, No. 2, Feb. 2010, pp. 437-447. (SCI期刊), 2010年02月
Date of Publication 2011-04-01