年度 | 2011 |
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全部作者 | 李義明 |
論文名稱 | Chun-Yen Yiu, Yung-Yueh Chiu, Thet-Thet Khaing, Kuo-Fu Lee, Yiming Li, “Suppression of Random-Dopant-Induced Characteristic Fluctuation in 16 nm MOSFET Devices Using Dual-Material Gate,”Proceedings of IEEE International Symposium on Next-Generation Electronics (IEEE ISNE 2010),Kaohsiung, Taiwan, Nov. 4-5, 2010, pp. 28-31. |
發表日期 | 2011-08-01 |