年度 | 2011 |
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全部作者 | 李義明 |
論文名稱 | Yiming Li, Chih-Hong Hwang, Tien-Yeh Li, and Ming-Hung Han, "Process Variation Effect, Metal-Gate Workfunction and Random Dopant Fluctuations in Emerging CMOS Technologies" , IEEE Transactions on Electron Devices, Vol. 57, No. 2, Feb. 2010, pp. 437-447. (SCI期刊), 2010年02月 |
發表日期 | 2011-04-01 |